Zirconium Nitride Sputtering Targets
Zirconium Nitride Sputtering Targets
| Zirconium Nitride Sputtering Targets | |
| Product No | NRE-43298 |
| CAS No. | 25658-42-8 |
| Formula | ZrN |
| Molecular Weight | 105.23 |
| Purity | >99.9% |
| Density | 7.09 g/cm3 |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Zirconium Nitride Sputtering Targets
Introduction:
Zirconium nitride (ZrN) sputtering targets are used to deposit thin films of zirconium nitride, a hard, durable material known for its exceptional properties. ZrN films exhibit high hardness, excellent wear resistance, and good thermal stability, making them suitable for various industrial applications. These targets are often utilized in physical vapor deposition (PVD) processes, where the target material is sputtered to create a thin film on a substrate.
Applications
Tool Coatings: ZrN is widely used as a coating for cutting tools and molds due to its hardness and wear resistance, extending the life of these tools in manufacturing processes.
Decorative Coatings: Zirconium nitride is employed in decorative applications, providing an aesthetically pleasing finish with a gold-like appearance on jewelry, watches, and automotive parts.
Semiconductor Industry: ZrN films can serve as diffusion barriers and interconnect materials in semiconductor devices, helping to improve electrical performance.
Biomedical Applications: The biocompatibility of zirconium nitride makes it suitable for coatings on medical devices and implants, promoting better integration with biological tissues.
Optical Coatings: ZrN can be used in optical coatings to enhance the durability and scratch resistance of lenses and mirrors.
High-Temperature Applications: Due to its thermal stability, zirconium nitride is used in applications exposed to high temperatures, such as in aerospace components and industrial furnaces.
