Zirconium Carbide Sputtering Targets
Zirconium Carbide Sputtering Targets
Zirconium Carbide Sputtering Targets | |
Product No | NRE-43297 |
CAS No. | 12070-14-3 |
Formula | ZrC |
Molecular Weight | 103.23 |
Purity | >99.9% |
Density | 6.73 g/cm3 (24 °C) |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Zirconium Carbide Sputtering Targets
Introduction
Zirconium carbide sputtering targets is a ceramic material known for its exceptional hardness, high melting point, and thermal stability. These properties make it an ideal candidate for use in sputtering targets, which are essential for thin-film deposition processes in various high-tech applications. Zirconium carbide is particularly valued in environments where wear resistance and thermal performance are critical.
Applications
Wear-Resistant Coatings:
ZrC is used to create hard coatings for tools and components that experience high friction and wear, enhancing their durability.
Thermal Barrier Coatings:
Employed in aerospace applications to protect components from extreme temperatures, such as in jet engines and turbine blades.
Semiconductor Manufacturing:
Used in the deposition of thin films for interconnects and gate electrodes, offering excellent electrical properties and reliability.
Optical Coatings:
Suitable for coatings that require high hardness and scratch resistance, used in lenses and protective covers.
Plasma Facing Materials:
Utilized in fusion reactors and other high-temperature applications due to its thermal stability and resistance to erosion.
Biomedical Applications:
Investigated for biocompatible coatings in medical implants, where durability and corrosion resistance are essential.
Nanotechnology:
Used in the fabrication of nanoscale devices, benefiting from the precise deposition control that sputtering allows.