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Yttrium Oxide Sputtering Target

Yttrium Oxide Sputtering Target

Yttrium Oxide Sputtering Target
Product No NRE-43180
CAS No. 1314-36-9
Formula Y2O3
Molecular Weight 225.81 g/mol
Purity >99 %
Density 5.010 g/cm³
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Yttrium Oxide Sputtering Target

Introduction:

Yttrium oxide sputtering target is a rare earth oxide known for its excellent thermal stability, high melting point, and unique optical and electrical properties. It is commonly used in various industrial applications, including electronics, optics, and materials science. As a sputtering target, yttrium oxide enables the deposition of high-quality thin films for a wide range of advanced technologies.

Applications:

Optical Coatings:

Y₂O₃ is widely utilized in optical coatings for lenses and mirrors, providing anti-reflective properties and improving light transmission.

Semiconductor Industry:

In the semiconductor field, yttrium oxide is used for the deposition of dielectric films, which are essential for insulating layers in electronic devices, enhancing their performance and reliability.

Phosphor Materials:

Yttrium oxide is used as a host material for phosphors in LED technology and display applications, contributing to enhanced brightness and efficiency.

Thermal Barrier Coatings:

Y₂O₃ serves as a thermal barrier coating in aerospace and industrial applications, protecting components from high temperatures and extending their lifespan.

Biomedical Applications:

Used in biocompatible coatings for medical devices, yttrium oxide enhances compatibility and performance in various biomedical applications.

Catalysts:

Yttrium oxide can be employed as a catalyst or catalyst support in various chemical reactions, including oxidation and fuel cell applications.

 

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