Yttrium Manganate Sputtering Targets
Yttrium Manganate Sputtering Targets
Yttrium Manganate Sputtering Targets | |
Product No | NRE-43288 |
CAS No. | 12032-75-6 |
Formula | YMnO3 |
Molecular Weight | 191.84 |
Purity | >99.9% |
Density | NA |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Yttrium Manganate Sputtering Targets
Introduction:
Yttrium manganate sputtering targets is a compound consisting of yttrium, manganese, and oxygen. It belongs to a class of materials known for their interesting magnetic and electrical properties, particularly as multiferroics. YMnO₃ exhibits strong magnetoelectric coupling, which makes it a valuable material in various advanced technological applications. As a sputtering target, yttrium manganate is used for the deposition of thin films that can be utilized in electronics, sensors, and other innovative technologies.
Applications
Multiferroic Devices:
YMnO₃ is a prime candidate for the development of multiferroic materials, which exhibit both magnetic and electric polarizations. These materials can be used in memory devices and spintronic applications.
Magnetic Sensors:
The unique properties of yttrium manganate make it suitable for use in magnetic sensors, where it can detect changes in magnetic fields with high sensitivity.
Spintronics:
YMnO₃ is explored for spintronic applications, where the manipulation of electron spin is utilized for advanced computing and memory technologies.
Optoelectronic Devices:
The optical properties of YMnO₃ allow for its use in optoelectronic applications, including light-emitting devices and photonic components.
Catalytic Applications:
Yttrium manganate can also serve as a catalyst in certain chemical reactions, particularly in oxidation processes.
Dielectric Materials:
Used in the production of dielectric films for electronic applications, enhancing performance in capacitors and other devices.