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Yttrium Aluminum Garnet (YAG) Sputtering Target

Yttrium Aluminum Garnet (YAG) Sputtering Target

Yttrium Aluminum Garnet (YAG) Sputtering Target
Product No NRE-43178
CAS No. 12005-21-9
Formula Y3Al5O12
Molecular Weight 593.62
Purity 99.99%
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round

 

Yttrium Aluminum Garnet (YAG) Sputtering Target

Introduction:

Yttrium aluminum garnet (YAG) sputtering target is a synthetic crystalline material composed of yttrium, aluminum, and oxygen, often represented by the formula Y₃Al₅O₁₂. YAG is known for its excellent optical, mechanical, and thermal properties, making it a popular choice in various advanced applications. As a sputtering target, YAG is used for the deposition of thin films that leverage its unique characteristics, particularly in optics and photonics.

Applications

Optical Components:

YAG is widely used in the production of optical coatings, including anti-reflective and reflective coatings for lenses, mirrors, and prisms, enhancing light transmission and reducing losses.

Laser Technology:

YAG serves as a host material for solid-state lasers, particularly in YAG lasers (e.g., Nd

Thin films of YAG are utilized in laser applications for improved efficiency and performance.

Electronics:

In the semiconductor industry, YAG is used for thin film deposition in electronic devices, contributing to improved performance and durability.

Biomedical Applications:

YAG coatings are used in medical devices, particularly in dental and orthopedic applications, where biocompatibility and mechanical strength are essential.

Hard Coatings:

YAG is utilized for protective coatings that enhance the hardness and wear resistance of tools and components in various industrial applications.

Phosphor Materials:

YAG is often used as a phosphor in LED technology, where it can be combined with other materials to produce specific light wavelengths.

 

 

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