Ytterbium Oxide Sputtering Target
Ytterbium Oxide Sputtering Target
Ytterbium Oxide Sputtering Target | |
Product No | NRE-43175 |
CAS No. | 1314-37-0 |
Formula | Yb2O3 |
Molecular Weight | 394.08g/mol |
Purity | 99.99% |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Ytterbium Oxide Sputtering Target
Introduction:
Ytterbium oxide sputtering target is a rare earth oxide known for its unique chemical and physical properties, including high thermal stability, good optical characteristics, and electrical insulation. As a sputtering target, ytterbium oxide is utilized in various thin film deposition processes, where its specific properties can enhance the performance of the resulting films.
Applications
Optical Coatings:
Yb₂O₃ is used in the production of optical coatings for lenses and mirrors, providing anti-reflective properties and improving light transmission.
Semiconductor Industry:
Employed in the fabrication of thin films for semiconductor devices, where its dielectric properties are advantageous for insulating layers.
Photovoltaic Cells:
Utilized in solar cell technology to enhance efficiency by optimizing light absorption and reducing reflection losses.
Laser Applications:
Ytterbium oxide serves as a host material in solid-state lasers, particularly for doping applications, which can improve laser efficiency and output.
Ceramic and Composite Materials:
Incorporated into advanced ceramics and composite materials to enhance mechanical properties and thermal stability.
Catalytic Applications:
Used in catalytic processes due to its ability to facilitate certain chemical reactions, particularly in oxidation reactions.