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Ytterbium Oxide Sputtering Target

Ytterbium Oxide Sputtering Target

Ytterbium Oxide Sputtering Target
Product No NRE-43175
CAS No. 1314-37-0
Formula Yb2O3
Molecular Weight 394.08g/mol
Purity 99.99%
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round

 

Ytterbium Oxide Sputtering Target

Introduction:

Ytterbium oxide sputtering target is a rare earth oxide known for its unique chemical and physical properties, including high thermal stability, good optical characteristics, and electrical insulation. As a sputtering target, ytterbium oxide is utilized in various thin film deposition processes, where its specific properties can enhance the performance of the resulting films.

Applications

Optical Coatings:

Yb₂O₃ is used in the production of optical coatings for lenses and mirrors, providing anti-reflective properties and improving light transmission.

Semiconductor Industry:

Employed in the fabrication of thin films for semiconductor devices, where its dielectric properties are advantageous for insulating layers.

Photovoltaic Cells:

Utilized in solar cell technology to enhance efficiency by optimizing light absorption and reducing reflection losses.

Laser Applications:

Ytterbium oxide serves as a host material in solid-state lasers, particularly for doping applications, which can improve laser efficiency and output.

Ceramic and Composite Materials:

Incorporated into advanced ceramics and composite materials to enhance mechanical properties and thermal stability.

Catalytic Applications:

Used in catalytic processes due to its ability to facilitate certain chemical reactions, particularly in oxidation reactions.

 

 

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