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Vanadium Nitride Sputtering Targets

Vanadium Nitride Sputtering Targets

Vanadium Nitride Sputtering Targets
Product No NRE-43598
CAS No. 24646-85-3
Formula VN
Molecular Weight 64.94
Purity >99.9%
Density 6.13 g/cm3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Vanadium Nitride Sputtering Targets

Introduction:

Vanadium nitride sputtering targets is a refractory compound known for its high hardness, excellent wear resistance, and good thermal stability. It is characterized by its metallic conductivity and is often used in various advanced applications, including coatings and thin films. Sputtering targets made from vanadium nitride are employed in physical vapor deposition (PVD) processes to produce high-quality thin films with tailored properties for numerous technological applications.

Applications:

Hard Coatings: VN is widely used to create hard coatings for cutting tools and industrial machinery, enhancing their wear resistance and extending their service life in demanding environments.

Electrical Contacts: Due to its metallic conductivity, vanadium nitride is suitable for use in electrical contacts, ensuring reliable performance in electronic devices and systems.

Wear-Resistant Films: VN coatings are applied to components that require enhanced abrasion resistance, such as automotive and aerospace parts, where durability is critical.

Magnetic Applications: Vanadium nitride can be utilized in magnetic materials and components, contributing to applications in sensors and memory devices.

Supercapacitors and Batteries: Research is ongoing into the use of vanadium nitride in energy storage devices, where its properties can enhance performance in supercapacitors and batteries.

Research and Development: VN sputtering targets are also used in laboratories for materials research, including studies focused on thin film technologies and new electronic materials.

 

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