Vanadium Aluminum Alloy Sputtering Targets
Vanadium Aluminum Alloy Sputtering Targets
| Vanadium Aluminum Alloy Sputtering Targets | |
| Product No | NRE-43595 |
| CAS No. | 12445-32-8 |
| Formula | V-Al |
| Molecular Weight | NA |
| Purity | >99.9% |
| Density | NA |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Vanadium Aluminum Alloy Sputtering Targets
Introduction:
Vanadium aluminum alloy sputtering targets are notable for their unique properties, including lightweight, high strength, and excellent resistance to corrosion and oxidation. These characteristics make them suitable for various high-performance applications, particularly in the aerospace and automotive industries. Sputtering targets made from vanadium-aluminium alloys are used in physical vapor deposition (PVD) processes to create thin films with desirable qualities for diverse technological applications.
Applications
Aerospace Components: V-Al alloys are commonly used in aerospace applications where high strength-to-weight ratios and resistance to extreme conditions are critical. They can be found in structural components and engine parts.
Electrical Contacts: The excellent conductivity of vanadium-aluminium alloys makes them suitable for electrical contact materials, where low resistance and durability are essential.
Coatings for Tools: Vanadium-aluminium sputtering targets are used to create hard coatings for cutting tools and industrial machinery, enhancing wear resistance and extending tool life.
Energy Storage: Research is ongoing into the use of V-Al alloys in energy storage applications, such as batteries and supercapacitors, leveraging their electrical properties for improved performance.
Magnetic Applications: Vanadium-aluminium alloys may be employed in certain magnetic applications, taking advantage of their unique electromagnetic properties.
