Tungsten Disulfide Sputtering Targets
Tungsten Disulfide Sputtering Targets
| Tungsten Disulfide Sputtering Targets | |
| Product No | NRE-43286 |
| CAS No. | 12138-09-9 |
| Formula | WS2 |
| Molecular Weight | 247.97 |
| Purity | >99.9% |
| Density | 7.5 g/cm3 |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Tungsten Disulfide Sputtering Targets
Introduction:
Tungsten disulfide sputtering targets is a transition metal dichalcogenide known for its unique layered structure and exceptional lubricating properties. It exhibits fascinating electrical, optical, and thermal characteristics, making it suitable for a variety of applications in electronics, materials science, and nanotechnology. Sputtering targets made from tungsten disulfide are used in physical vapor deposition (PVD) processes to create thin films with tailored properties for diverse applications.
Applications:
Lubricating Coatings: WS₂ is widely used to create solid lubricating films that reduce friction and wear in various mechanical components, enhancing their performance and longevity.
Electronics: Tungsten disulfide films can be used in electronic devices as semiconductors and in the fabrication of field-effect transistors (FETs), contributing to advancements in flexible and low-power electronics.
Energy Storage: WS₂ is explored for use in batteries and supercapacitors, where its layered structure can facilitate ion transport, improving energy storage capabilities.
Optoelectronic Devices: The optical properties of WS₂ make it suitable for applications in photodetectors, light-emitting devices, and other optoelectronic components.
Sensors: Tungsten disulfide can be utilized in gas sensors and other sensing applications, where its sensitivity to environmental changes is advantageous.
