Terbium Fluoride Sputtering Targets
Terbium Fluoride Sputtering Targets
| Terbium Fluoride Sputtering Targets | |
| Product No | NRE-43568 |
| CAS No. | 13708-63-9 |
| Formula | TbF3 |
| Molecular Weight | 215.92 |
| Purity | >99.9% |
| Density | NA |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Terbium Fluoride Sputtering Targets
Introduction
Terbium fluoride sputtering target is an inorganic compound that serves as a sputtering target in various thin film deposition processes. Terbium, a rare earth element, has unique optical and magnetic properties, making its compounds useful in advanced materials science and technology.
Applications
Optoelectronic Devices: Terbium fluoride is used in the fabrication of optoelectronic devices, such as phosphors for displays and LED technologies. Its luminescent properties can enhance the brightness and efficiency of these devices.
Magnetic Materials: TbF₃ is also explored for its magnetic properties. It can be used in the development of magneto-optical materials and spintronic devices.
Thin Film Coatings: Terbium fluoride thin films can be deposited for optical coatings that require specific refractive indices or optical characteristics, such as anti-reflective coatings.
Laser Applications: Terbium ions can be incorporated into laser materials. TbF₃ can serve as a host material in solid-state lasers, providing desirable emission characteristics.
Catalysis: The unique properties of terbium compounds, including TbF₃, can be utilized in catalytic processes, potentially improving reaction efficiency in various chemical reactions.
Nuclear Applications: Terbium compounds are sometimes used in radiation detection and shielding materials due to their effective absorption of certain types of radiation.
