Our Products

Sputtering Target Metallic Bond

Sputtering Target Metallic Bond
Product No NRE-43143
CAS No. NA
Formula NA
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape NA
Resistivity NA
Thermal Conductivity NA

Sputtering Target Metallic Bond

Introduction:

Sputtering target metallic bond refer to the interactions and connections within metallic materials used as targets in the sputtering process. Sputtering is a physical vapor deposition (PVD) technique where energetic particles are used to eject atoms from a target material, which are then deposited onto a substrate to form thin films. Metallic bonds in these targets are characterized by a strong interaction between metal atoms, providing unique properties such as electrical conductivity, thermal conductivity, and malleability. The choice of metallic targets is crucial in various applications, particularly in electronics, optics, and materials science.

Applications:

Thin Film Deposition: Metallic sputtering targets are widely used to deposit conductive films in semiconductor devices, printed circuit boards, and other electronic components. The strong metallic bonds allow for efficient atom ejection and deposition.

Optical Coatings: Metals like silver, gold, and aluminum are commonly used in sputtering targets for optical coatings. These metals provide high reflectivity and are used in mirrors, lenses, and filters, enhancing the performance of optical devices.

Wear-Resistant Coatings: Sputtered metallic films can be applied as protective coatings on tools and machinery. The strong metallic bonds contribute to enhanced wear resistance and durability, making these coatings ideal for harsh environments.

Thermal Barrier Coatings: Certain metals, such as nickel and cobalt, are used in sputtering targets for thermal barrier coatings. These coatings protect substrates from high temperatures in aerospace and automotive applications.

Magnetic Materials: Metallic bond in sputtering targets can be utilized to deposit thin films of magnetic materials for data storage devices, sensors, and other applications in magnetics and spintronics.

Alloy Coatings: Metallic sputtering targets can also be composed of alloys, allowing for the deposition of complex films that combine the properties of multiple metals. This is useful in applications where specific characteristics, such as hardness or corrosion resistance, are desired.

 

error: