Nickel Chromium Silicon Alloy Sputtering Targets
Nickel Chromium Aluminium Alloy Sputtering Targets
Nickel Chromium Silicon Alloy Sputtering Targets | |
Product No | NRE-43518 |
CAS No. | NA |
Formula | Ni-Cr-Si |
Molecular Weight | NA |
Purity | >99.9% |
Density | NA |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Nickel Chromium Silicon Alloy Sputtering Targets
Introduction:
Nickel chromium silicon (Ni-Cr-Si) alloy sputtering targets are composite materials that combine nickel, chromium, and silicon. These alloys are notable for their excellent mechanical properties, high-temperature stability, oxidation resistance, and semiconductor characteristics. The inclusion of silicon enhances the alloy’s performance in various applications, particularly in electronics and surface engineering. Sputtering techniques allow for precise deposition of thin films of these alloys on various substrates.
Applications
Thin Film Transistors (TFTs):
Ni-Cr-Si alloys are utilized in the fabrication of thin film transistors, particularly in display technologies like LCDs and OLEDs, where their electrical properties enhance device performance.
Magnetic Materials:
The magnetic properties of nickel chromium silicon alloys make them suitable for use in magnetic sensors and devices, contributing to advancements in data storage and spintronic applications.
Protective Coatings:
These alloys provide excellent corrosion and oxidation resistance, making them ideal for protective coatings in various industries, including aerospace, automotive, and chemical processing.
High-Temperature Applications:
Ni-Cr-Si alloys maintain their mechanical properties at elevated temperatures, making them suitable for applications in gas turbines and other high-temperature environments.
Surface Engineering:
The alloys are used in surface engineering processes to enhance the mechanical and thermal properties of materials, improving durability and performance in harsh conditions.
Research and Development:
Nickel chromium silicon alloy sputtering targets are employed in research settings to study new materials, their properties, and potential applications in fields like materials science and nanotechnology.
Electrochemical Applications:
The alloy’s stability and conductivity make it suitable for electrochemical applications, including fuel cells and batteries.