Ni80Cr20 sputtering target
Ni80Cr20 sputtering target
| Ni80Cr20 sputtering target | |
| Product No | NRE-43644 |
| CAS No. | NA |
| Formula | NA |
| Molecular Weight | NA |
| Purity | >99.9% |
| Density | NA |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Ni80Cr20 sputtering target
Ni80Cr20 sputtering target are commonly used in various applications, particularly in the deposition of thin films in the semiconductor and photovoltaic industries. Here are some key applications.
Thin Film Deposition: Ni80Cr20 targets are used for sputtering thin films that are essential in electronics and optoelectronics.
Resistive Heating Elements: The alloy is often utilized to create resistive heating elements due to its excellent thermal stability and resistance to oxidation.
Corrosion-Resistant Coatings: The alloy provides good corrosion resistance, making it suitable for protective coatings in harsh environments.
Magnetic Applications: It can be used in magnetic materials and components due to its magnetic properties when alloyed properly.
Sensor Applications: Ni80Cr20 films can be used in sensors, particularly in temperature and pressure sensing applications.
Decorative Coatings: The alloy’s aesthetic finish makes it suitable for decorative coatings in various industries.
Interconnects in Electronics: It is also used in electronic interconnects due to its electrical conductivity and mechanical properties.
These applications leverage the alloy’s favorable properties, including high melting point, good mechanical strength, and resistance to oxidation at high temperatures.
