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Molybdenum Disulphide Sputtering Target

Molybdenum Disulphide Sputtering Target

Molybdenum Disulphide Sputtering Target
Product No NRE-48105
CAS No. 1317-33-5
Formula MoS2
Molecular Weight 160.07 g/mol
Purity 99.99%
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round

Molybdenum Disulphide Sputtering Target

Introduction

Molybdenum disulfide (MoS₂) sputtering targets are materials used in thin film deposition processes, known for their unique lubricating properties, electrical conductivity, and ability to form two-dimensional structures. This transition metal dichalcogenide is valuable in various applications across electronics, lubrication, and materials science.

Applications

Lubrication:

MoS₂ is widely used in lubricants, especially in extreme conditions, due to its low friction coefficient and high load-bearing capacity.

Semiconductor Devices:

Used in the fabrication of thin films for transistors and other electronic components, leveraging its semiconductor properties for improved performance.

Optoelectronics:

Employed in the production of photodetectors and light-emitting devices, enhancing their efficiency and functionality.

Energy Storage:

MoS₂ can be utilized in battery applications, particularly in improving the performance of lithium-ion batteries as an anode material.

Research and Development:

Frequently used in R&D to explore new applications in nanotechnology and advanced materials, including studies on two-dimensional materials.

Conclusion

Molybdenum disulfide sputtering targets are essential in a variety of high-performance applications, from electronics to lubrication and energy storage.

 

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