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Manganese Selenide Sputtering Targets

Manganese Selenide Sputtering Targets

Manganese Selenide Sputtering Targets
Product No NRE-43494
CAS No. 1313-22-0
Formula MnSe
Molecular Weight 133.9
Purity >99.9%
Density 5.59 g/cm3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Manganese Selenide Sputtering Targets

Introduction

Manganese selenide sputtering targets are compounds used in thin film deposition processes, known for their semiconductor properties. These targets are valuable in various applications due to their unique electronic and optical characteristics, particularly in the fabrication of advanced materials.

Applications

Semiconductors: Used in the production of semiconductor devices, including transistors and diodes, benefiting from MnSe’s suitable bandgap properties.

Optoelectronics: Employed in the fabrication of light-emitting diodes (LEDs) and photodetectors, enhancing performance in light conversion and detection.

Solar Cells: Applied in thin-film solar cell technologies, improving efficiency by serving as a light-absorbing layer.

Magnetic Materials: Useful in developing magnetic thin films for spintronic applications, leveraging its magnetic properties for advanced data storage solutions.

Research and Development: Frequently used in R&D for exploring new materials in semiconductor and optoelectronic applications, aiding in the discovery of innovative technologies.

Conclusion

Manganese selenide sputtering targets are crucial in advancing electronic and optoelectronic technologies, providing solutions for improved efficiency and performance in various applications across multiple industries. Their unique properties position them as essential materials in modern material science.

 

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