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Manganese Nickel Alloy Sputtering Targets

Manganese Nickel Alloy Sputtering Targets

Manganese Nickel Alloy Sputtering Targets
Product No NRE-43492
CAS No. NA
Formula Mn-Ni
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Manganese Nickel Alloy Sputtering Targets

Introduction

Manganese nickel alloys combine the properties of manganese and nickel to create materials that exhibit enhanced strength, corrosion resistance, and magnetic properties. As sputtering targets, these alloys are used to deposit thin films in various applications, particularly in electronics, materials science, and magnetic technologies.

Properties of Manganese Nickel Alloys

High Strength: The addition of manganese to nickel improves the tensile strength of the alloy, making it suitable for structural applications.

Corrosion Resistance: Manganese nickel alloys typically offer good resistance to oxidation and corrosion, which extends the lifespan of coatings.

Magnetic Properties: These alloys can exhibit interesting magnetic behaviors, making them valuable in magnetic applications.

Ductility: They maintain good ductility, allowing for easy processing and shaping.

Applications of Manganese Nickel Alloy Sputtering Targets

Magnetic Films: Manganese nickel alloys are utilized to create thin films for magnetic applications, including magnetic sensors, data storage devices, and inductors.

Electronics: These alloys are employed in the fabrication of electronic components, such as capacitors and connectors, benefiting from their conductivity and strength.

Protective Coatings: The corrosion resistance of manganese nickel alloys makes them suitable for protective coatings in various industries, enhancing the durability of surfaces.

Biomedical Applications: Due to their biocompatibility, manganese nickel alloys may find applications in medical devices and implants.

Research and Development: Ongoing research explores the unique properties of these alloys for innovative applications in materials science and engineering.

Sputtering Process

In the sputtering process, a manganese nickel alloy target is bombarded with energetic ions, causing atoms to be ejected from the target surface.

 

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