Magnesium Fluoride Sputtering Targets (MgF2, Purity: 99.9%, Dia: 50mm, Thickness: 3mm)
Magnesium Fluoride Sputtering Targets
Magnesium Fluoride Sputtering Targets | |
Product No | NRE-43098 |
CAS No. | 7783-40-6 |
Formula | MgF2 |
Molecular Weight | 62.301 g/mol |
Purity | >99.9% |
Density | 3.148 g/cm³ |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Expansion | NA |
Magnesium Fluoride Sputtering Targets
Introduction
Magnesium fluoride sputtering targets is an inorganic compound known for its excellent optical and physical properties. As a sputtering target, magnesium fluoride is widely used in the deposition of thin films for various advanced applications, particularly in optics, electronics, and coatings. Its unique characteristics make it a preferred material for applications requiring transparency and durability.
Applications of Magnesium Fluoride Sputtering Targets
Optical Coatings: MgF₂ is commonly used in the production of anti-reflective coatings for lenses, windows, and mirrors, improving light transmission and reducing glare.
Thin Film Transistors: It is utilized in the fabrication of transparent conductive films for displays and other electronic devices, where high optical clarity is essential.
Laser Components: Magnesium fluoride coatings are employed in laser optics, including mirrors and beam splitters, due to their optical properties.
Protective Coatings: MgF₂ can serve as a protective layer for various surfaces, enhancing durability against scratches and environmental factors.
Photovoltaics: Its optical properties make it suitable for coatings in solar cells, optimizing light absorption and improving efficiency.