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Magnesium Fluoride Sputtering Targets (MgF2, Purity: 99.9%, Dia: 50mm, Thickness: 3mm)

Magnesium Fluoride Sputtering Targets

Magnesium Fluoride Sputtering Targets
Product No NRE-43098
CAS No. 7783-40-6
Formula MgF2
Molecular Weight 62.301 g/mol
Purity >99.9%
Density 3.148 g/cm³
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Expansion NA

Magnesium Fluoride Sputtering Targets

Introduction

Magnesium fluoride sputtering targets is an inorganic compound known for its excellent optical and physical properties. As a sputtering target, magnesium fluoride is widely used in the deposition of thin films for various advanced applications, particularly in optics, electronics, and coatings. Its unique characteristics make it a preferred material for applications requiring transparency and durability.

Applications of Magnesium Fluoride Sputtering Targets

Optical Coatings: MgF₂ is commonly used in the production of anti-reflective coatings for lenses, windows, and mirrors, improving light transmission and reducing glare.

Thin Film Transistors: It is utilized in the fabrication of transparent conductive films for displays and other electronic devices, where high optical clarity is essential.

Laser Components: Magnesium fluoride coatings are employed in laser optics, including mirrors and beam splitters, due to their optical properties.

Protective Coatings: MgF₂ can serve as a protective layer for various surfaces, enhancing durability against scratches and environmental factors.

Photovoltaics: Its optical properties make it suitable for coatings in solar cells, optimizing light absorption and improving efficiency.

 

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