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Hafnium Sputtering Target

Hafnium Sputtering Target

Hafnium Sputtering Target
Product No NRE-43064
CAS No. 7440-58-6
Formula Hf
Molecular Weight 178.49
Purity 99.95%
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round

Hafnium Sputtering Target

Introduction

Hafnium sputtering targets are materials used in the sputtering process to deposit hafnium-based thin films onto various substrates. Hafnium is a transition metal known for its high melting point, excellent corrosion resistance, and unique electrical and thermal properties. These characteristics make hafnium sputtering targets essential in various advanced applications across electronics, optics, and materials science.

Applications of Hafnium Sputtering Targets

Semiconductor Manufacturing:

Hafnium is widely used as a high-k dielectric material in advanced transistors and capacitors. Its ability to enhance capacitance while reducing leakage currents is crucial for modern CMOS technology, enabling the development of smaller, more efficient devices.

Optical Coatings:

Hafnium thin films are employed in optical coatings for mirrors, lenses, and filters. Their high refractive index and durability improve the performance and lifespan of optical components.

Barrier Layers:

In microelectronics, hafnium serves as an effective diffusion barrier in metal interconnects, preventing the migration of metals and enhancing the reliability of integrated circuits.

Protective Coatings:

Hafnium thin films provide excellent chemical and thermal resistance, making them suitable for protective coatings in harsh environments, such as aerospace and industrial applications.

MEMS Devices:

Hafnium is used in microelectromechanical systems (MEMS) for its favorable mechanical and electrical properties, contributing to the functionality and reliability of miniature devices.

Research and Development:

Hafnium sputtering targets are valuable in material science research, allowing scientists to investigate new properties and functionalities in hafnium-based materials for emerging technologies.

Overall, hafnium sputtering targets are critical in advancing various technologies, providing high-quality thin films that meet the demands of modern applications across multiple industries.

 

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