Boron Sputtering Target
Boron Sputtering Target
Boron Sputtering Target | |
Product No | NRE-43021 |
CAS No. | 7440-42-8 |
Formula | B |
Molecular Weight | 10.81 g/mol |
Purity | >99.99% |
Density | 2.34 g/cm³ |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Electronegativity | NA |
Boron Sputtering Target
Boron sputtering targets are used to deposit boron-based thin films in various applications due to boron’s unique properties, including its hardness, high melting point, and ability to form various compounds. Here are some specific applications for boron sputtering targets.
Semiconductor and Electronics
Doping Layers: Boron is commonly used as a dopant in semiconductor materials, especially in silicon to create p-type semiconductors. Boron sputtering targets are used to deposit boron films or layers for doping purposes in semiconductor devices.
Gate Dielectrics: In advanced semiconductor devices, boron films can serve as gate dielectrics in transistors, offering high stability and performance.
Optical Coatings
Anti-Reflective Coatings: Boron-based thin films can be used in optical coatings to produce anti-reflective layers. These coatings improve the performance of lenses, mirrors, and other optical components by reducing reflection and enhancing transmission.
Protective Coatings: Boron coatings can also be used to protect optical surfaces from environmental damage and wear.
Hard Coatings
Wear-Resistant Coatings: Boron is known for its hardness and durability. Boron sputtered coatings can be applied to tools and industrial parts to enhance their resistance to abrasion and wear, extending their service life.
Cutting Tools: Coatings for cutting tools and drill bits made from boron improve their performance and longevity by increasing hardness and reducing friction.
Thermal Barrier Coatings
Heat Resistance: Boron coatings can be used as thermal barriers to protect components from high temperatures. This is particularly useful in aerospace and high-temperature industrial applications.
Ceramic and Composite Materials
Boron Carbide Formation: Boron sputtering targets can be used in processes to form boron carbide (B₄C), which is a highly durable ceramic material. Boron carbide is used in armor, cutting tools, and various industrial applications due to its hardness and light weight.
Composite Materials: Boron-based films can be used to create or enhance composite materials, improving their mechanical and thermal properties.
Nuclear Applications
Neutron Absorption: Boron has excellent neutron-absorbing properties, making it useful in nuclear reactors. Sputtered boron films or coatings can be used in neutron control rods or shielding applications.
Battery Technologies
Electrode Coatings: Boron-based coatings can be used on electrodes in batteries to improve performance, increase conductivity, or extend the lifespan of the battery components.