Sputtering Targets

Sputtering targets are essential components in the process of physical vapor deposition (PVD) used for thin film deposition in various industries. Sputtering is a technique where atoms or molecules are ejected from a solid target material and deposited onto a substrate to create a thin film. Sputtering targets play a crucial role in this process and find applications in several areas. Here are some of the Key Applications: Semiconductor Manufacturing: Sputtering targets are extensively used in the production of integrated circuits and semiconductor devices. Thin films deposited through sputtering are employed in the fabrication of transistors, capacitors, and other components on semiconductor wafers.