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Manganese Sputtering Target (Mn, Purity: 99.99%)

Manganese Sputtering Target

Manganese Sputtering Target
Product No NRE-43103
CAS No. 7439-96-5
Formula Mn
Molecular Weight 54.938 g/mol
Purity >99 %
Density 7.21 g/cm³
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Expansion NA

Manganese Sputtering Target

Introduction:

Manganese sputtering target are materials used in thin film deposition processes, playing a significant role in various technological applications. Manganese, as a transition metal, exhibits unique properties such as ferromagnetism and good electrical conductivity, making it valuable in electronic and magnetic applications.

Applications:

Magnetic Thin Films:

Mn Used in the fabrication of magnetic materials for data storage devices, including hard drives and magnetic sensors, leveraging manganese’s ferromagnetic properties.

Semiconductor Devices:

Employed in the production of thin films for transistors and diodes, contributing to advancements in electronics.

Catalysts:

Manganese is utilized in catalytic applications, particularly in environmental technologies such as gas sensors and catalysts for chemical reactions.

Battery Technology:

Incorporated in the development of cathode materials for lithium-ion batteries, improving energy density and cycling stability.

Coating Applications:

Manganese sputtering targets can be used for protective coatings in industrial applications, enhancing wear resistance and durability.

Conclusion

Manganese sputtering targets are essential in advancing various technologies, particularly in the fields of electronics, magnetics, and catalysis. Their unique properties enable innovative solutions and applications across multiple industries, making them valuable materials in modern manufacturing and research.

 

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