Ni80Fe20 sputtering target
Ni80Fe20 sputtering target
Ni80Fe20 sputtering target | |
Product No | NRE-43645 |
CAS No. | NA |
Formula | NA |
Molecular Weight | NA |
Purity | >99.9% |
Density | NA |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Ni80Fe20 sputtering target
Introduction
Ni80Fe20, also known as Permalloy, is an alloy composed of 80% nickel and 20% iron. This material is well-known for its excellent magnetic properties, particularly its high permeability and low coercivity, making it highly suitable for a variety of applications in the electronics and magnetic industries. Sputtering is a physical vapor deposition (PVD) technique that utilizes Ni80Fe20 targets to create thin films with precise control over the material’s properties.
Applications
Magnetic Sensors: Due to its magnetic properties, Ni80Fe20 is widely used in magnetic sensors, including Hall effect sensors and magnetic field sensors.
Data Storage: The alloy is used in thin-film magnetic materials for hard disk drives and magnetic recording media, where high sensitivity and low noise are crucial.
Transformers and Inductors: Ni80Fe20 films are employed in high-frequency transformers and inductors to improve efficiency and reduce losses.
Shielding Applications: Its magnetic properties make it effective for electromagnetic interference (EMI) shielding in electronic devices.
Spintronic Devices: Ni80Fe20 is utilized in spintronics, a field that exploits the intrinsic spin of electrons for information processing and storage.
Microelectromechanical Systems (MEMS): The alloy can be used in MEMS applications, where precise magnetic properties are needed for actuators and sensors.
Research and Development: In academic and industrial research, Ni80Fe20 thin films are studied for their unique properties and potential applications in advanced technologies.