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Ni80Fe20 sputtering target

Ni80Fe20 sputtering target

Ni80Fe20 sputtering target
Product No NRE-43645
CAS No. NA
Formula NA
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Ni80Fe20 sputtering target

Introduction

Ni80Fe20, also known as Permalloy, is an alloy composed of 80% nickel and 20% iron. This material is well-known for its excellent magnetic properties, particularly its high permeability and low coercivity, making it highly suitable for a variety of applications in the electronics and magnetic industries. Sputtering is a physical vapor deposition (PVD) technique that utilizes Ni80Fe20 targets to create thin films with precise control over the material’s properties.

Applications

Magnetic Sensors: Due to its magnetic properties, Ni80Fe20 is widely used in magnetic sensors, including Hall effect sensors and magnetic field sensors.

Data Storage: The alloy is used in thin-film magnetic materials for hard disk drives and magnetic recording media, where high sensitivity and low noise are crucial.

Transformers and Inductors: Ni80Fe20 films are employed in high-frequency transformers and inductors to improve efficiency and reduce losses.

Shielding Applications: Its magnetic properties make it effective for electromagnetic interference (EMI) shielding in electronic devices.

Spintronic Devices: Ni80Fe20 is utilized in spintronics, a field that exploits the intrinsic spin of electrons for information processing and storage.

Microelectromechanical Systems (MEMS): The alloy can be used in MEMS applications, where precise magnetic properties are needed for actuators and sensors.

Research and Development: In academic and industrial research, Ni80Fe20 thin films are studied for their unique properties and potential applications in advanced technologies.

 

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