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Strontium Ferrous Sputtering Targets

Strontium Ferrous Sputtering Targets

Strontium Ferrous Sputtering Targets
Product No NRE-43552
CAS No. NA
Formula SrFeO3
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Strontium Ferrous Sputtering Targets

Introduction

Strontium ferrous sputtering targets are specialized materials used in physical vapor deposition (PVD) processes, particularly in sputtering techniques. These targets are typically composed of strontium (Sr) combined with iron (Fe) in various stoichiometries. Their unique properties make them valuable in the fabrication of thin films for electronic, optical, and magnetic applications.

Applications

Thin Film Electronics: Strontium ferrous materials are often used in the production of high-performance thin films for semiconductor devices. Their electrical properties can be tailored for specific electronic applications.

Magnetic Materials: The ferrous component lends magnetic properties to the films, making them suitable for use in magnetic sensors, data storage devices, and spintronic applications.

Optical Coatings: These targets can be used to create optical coatings that enhance the performance of lenses, mirrors, and other optical components by improving light transmission and reflection characteristics.

Ferroelectric Devices: Strontium compounds, particularly when combined with iron, can exhibit ferroelectric behavior, making them ideal for applications in non-volatile memory devices and other ferroelectric technologies.

Catalysis: Strontium and iron can play a role in catalytic processes, making these sputtered films useful in various chemical reactions, including those in fuel cells and sensors.

 

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