Lead Fluoride Sputtering Targets
Lead Fluoride Sputtering Targets
| Lead Fluoride Sputtering Targets | |
| Product No | NRE-43479 |
| CAS No. | 7783-46-2 |
| Formula | PbF2 |
| Molecular Weight | 245.2 |
| Purity | >99.9% |
| Density | 8.445 g/cm3 |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Lead Fluoride Sputtering Targets
Introduction
Lead fluoride (PbF₂) is a compound that has gained attention in various applications due to its unique optical and electronic properties. Sputtering is a physical vapor deposition (PVD) technique used to create thin films of materials on substrates, and lead fluoride sputtering targets are specifically utilized in this process to deposit PbF₂ films.
Applications
Optical Coatings: PbF₂ is often used in the production of anti-reflective coatings and optical filters due to its high transmission in the UV and visible spectra. These coatings are essential in lasers, lenses, and other optical devices.
Infrared Optics: The unique refractive index and low absorption make lead fluoride suitable for infrared optical components. It’s used in IR windows, lenses, and prisms.
Semiconductor Fabrication: In the semiconductor industry, PbF₂ thin films can serve as dielectric materials or as etch masks, contributing to the miniaturization of electronic devices.
Radiation Detection: Lead fluoride can be employed in radiation detectors, particularly for its ability to detect alpha and beta particles due to its scintillation properties.
Research Applications: In scientific research, PbF₂ films are used in experiments requiring specific optical properties, making them valuable in fields like photonics and materials science.
