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Yttrium Titanate Sputtering Targets

Yttrium Titanate Sputtering Targets

Yttrium Titanate Sputtering Targets
Product No NRE-43289
CAS No. NA
Formula YTiO3
Molecular Weight NA
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Yttrium Titanate Sputtering Targets

Introduction:

Yttrium titanate sputtering targets is a ceramic compound that combines yttrium and titanium oxides. Known for its unique electrical, thermal, and optical properties, yttrium titanate is commonly used in various advanced applications, particularly in electronics and materials science. As a sputtering target, Y₂TiO₅ is utilized to create high-quality thin films through deposition processes that are essential for a wide range of technological applications.

Applications:

Dielectric Materials:

Yttrium titanate is widely used in the production of dielectric films, which are essential for capacitors and other electronic components due to their high dielectric constant.

Ferroelectric Devices:

Y₂TiO₅ exhibits ferroelectric properties, making it suitable for applications in non-volatile memory devices and sensors that require efficient charge storage.

Thin Film Transistors (TFTs):

Yttrium titanate thin films are used in thin film transistors, particularly in display technologies like LCDs and OLEDs, enhancing performance and efficiency.

Optoelectronic Applications:

Y₂TiO₅ is employed in optoelectronic devices, where its optical properties contribute to improved performance in light-emitting diodes (LEDs) and other photonic applications.

High-Temperature Superconductors:

In the context of superconductivity, yttrium titanate is studied for its potential role in high-temperature superconducting materials and related applications.

Catalysts:

Yttrium titanate can also serve as a catalyst or support in various chemical reactions, particularly in the synthesis of advanced materials.

 

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