Magnesium Zinc Oxide Sputtering Targets
Magnesium Zinc Oxide Sputtering Targets
| Magnesium Zinc Oxide Sputtering Targets | |
| Product No | NRE-43253 |
| CAS No. | NA |
| Formula | Mg(1-x) ZnO |
| Molecular Weight | NA |
| Purity | >99.9% |
| Density | NA |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Magnesium Zinc Oxide Sputtering Targets
Introduction
Magnesium zinc oxide sputtering targets is a compound that combines the properties of magnesium oxide sputtering target and zinc oxide, resulting in a material with unique characteristics. As a sputtering target, magnesium zinc oxide is utilized for depositing thin films in various advanced applications, particularly in electronics, optoelectronics, and materials science.
Applications of Magnesium Zinc Oxide Sputtering Targets
Transparent Conductive Oxides (TCOs): MgZnO is used to create transparent conductive films for applications in displays, solar cells, and LEDs, where both transparency and conductivity are required.
Optoelectronic Devices: This material is utilized in the fabrication of optoelectronic components, such as UV light-emitting diodes (LEDs) and laser diodes, due to its favorable electronic and optical properties.
High-Efficiency Solar Cells: Magnesium zinc oxide can be used as a window layer in thin-film solar cells, improving light absorption and overall efficiency.
Thin-Film Transistors: MgZnO is employed in the production of thin-film transistors (TFTs) for applications in flat-panel displays and other electronic devices.
Research and Development: As a subject of ongoing research, magnesium zinc oxide is explored for novel applications in electronics and photonics, particularly in the development of next-generation devices.
