Lead Oxide Sputtering Targets
Lead Oxide Sputtering Targets
| Lead Oxide Sputtering Targets | |
| Product No | NRE-43244 |
| CAS No. | 1317-36-8 |
| Formula | PbO |
| Molecular Weight | 223.2 |
| Purity | >99.9% |
| Density | 9.53 g/cm3 |
| Thickness | 3 mm ± 0.5mm (can be customized) |
| Diameter | 50 mm ± 1mm (can be customized) |
| Shape | Round |
| Resistivity | NA |
| Thermal Conductivity | NA |
Lead Oxide Sputtering Targets
Introduction
Lead oxide sputtering targets is a significant compound used in various industrial applications due to its distinctive chemical and physical properties. Sputtering targets made from lead oxide are utilized in the deposition of thin films through physical vapor deposition (PVD) techniques, which enable the creation of high-quality films for numerous applications.
Applications
Electronics: Lead oxide is widely used in the production of conductive and dielectric thin films for electronic components, including capacitors and resistors.
Optical Coatings: Due to its high refractive index, lead oxide is employed in optical coatings for lenses, filters, and mirrors, enhancing their performance in visible and UV light applications.
Photovoltaic Cells: In solar energy applications, lead oxide can be used in certain types of photovoltaic cells, improving their efficiency and performance.
Glass Manufacturing: Lead oxide is a key component in lead glass, which is known for its clarity and brilliance. Sputtering can help create coatings for glass products, enhancing their properties.
X-ray Imaging: Lead oxide is used in X-ray detectors and imaging systems due to its effective absorption of X-rays, making it suitable for medical and industrial imaging applications.
Sensors and Actuators: Its unique electrical properties allow lead oxide to be used in sensors and actuators, particularly in environments requiring high-temperature stability.
