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Lanthanum Gallate Sputtering Targets

Lanthanum Gallate Sputtering Targets

Lanthanum Gallate Sputtering Targets
Product No NRE-43232
CAS No. NA
Formula LaGaO3
Molecular Weight 256.63
Purity >99.9%
Density NA
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Resistivity NA
Thermal Conductivity NA

Lanthanum Gallate Sputtering Targets

Introduction

Lanthanum gallate (LaGaO3) is a perovskite oxide known for its excellent ionic conductivity and stability, making it a valuable material in various advanced technological applications. Sputtering targets made from lanthanum gallate are used for the deposition of high-quality thin films in fields such as electronics, energy, and environmental science.

Applications

Solid Oxide Fuel Cells (SOFCs):

Electrolytes and Cathodes: LaGaO3 is often used as an electrolyte material in SOFCs due to its high ionic conductivity at intermediate temperatures. Its properties enhance the overall efficiency of the fuel cells.

Catalysis:

Catalytic Supports: Lanthanum gallate can serve as a support for catalytic materials in various reactions, improving the activity and selectivity of catalysts in chemical processes.

Electronic Devices:

Dielectric Materials: LaGaO3 is explored for its potential as a dielectric material in capacitors and other electronic components, benefiting from its high dielectric constant and stability.

Thin Film Transistors (TFTs):

Display Technology: Sputtered LaGaO3 films can be used in TFTs for improved performance in flat-panel displays, contributing to better efficiency and responsiveness.

Sensors:

Gas Sensors: The ionic conductivity and stability of LaGaO3 make it suitable for use in gas sensors, where it can detect various environmental gases with high sensitivity.

Photovoltaics:

Thin Film Solar Cells: Research is ongoing into the use of LaGaO3 in thin film solar cells, where its properties can enhance light absorption and energy conversion efficiency.

 

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