Lanthanum Gallate Sputtering Targets
Lanthanum Gallate Sputtering Targets
Lanthanum Gallate Sputtering Targets | |
Product No | NRE-43232 |
CAS No. | NA |
Formula | LaGaO3 |
Molecular Weight | 256.63 |
Purity | >99.9% |
Density | NA |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Resistivity | NA |
Thermal Conductivity | NA |
Lanthanum Gallate Sputtering Targets
Introduction
Lanthanum gallate (LaGaO3) is a perovskite oxide known for its excellent ionic conductivity and stability, making it a valuable material in various advanced technological applications. Sputtering targets made from lanthanum gallate are used for the deposition of high-quality thin films in fields such as electronics, energy, and environmental science.
Applications
Solid Oxide Fuel Cells (SOFCs):
Electrolytes and Cathodes: LaGaO3 is often used as an electrolyte material in SOFCs due to its high ionic conductivity at intermediate temperatures. Its properties enhance the overall efficiency of the fuel cells.
Catalysis:
Catalytic Supports: Lanthanum gallate can serve as a support for catalytic materials in various reactions, improving the activity and selectivity of catalysts in chemical processes.
Electronic Devices:
Dielectric Materials: LaGaO3 is explored for its potential as a dielectric material in capacitors and other electronic components, benefiting from its high dielectric constant and stability.
Thin Film Transistors (TFTs):
Display Technology: Sputtered LaGaO3 films can be used in TFTs for improved performance in flat-panel displays, contributing to better efficiency and responsiveness.
Sensors:
Gas Sensors: The ionic conductivity and stability of LaGaO3 make it suitable for use in gas sensors, where it can detect various environmental gases with high sensitivity.
Photovoltaics:
Thin Film Solar Cells: Research is ongoing into the use of LaGaO3 in thin film solar cells, where its properties can enhance light absorption and energy conversion efficiency.