Titanium Nitride Sputtering Target
Titanium Nitride Sputtering Target
Titanium Nitride Sputtering Target | |
Product No | NRE-43162 |
CAS No. | 25583-20-4 |
Formula | TiN |
Molecular Weight | 61.87 g/mol |
Purity | 99.9% |
Density | 5.24 g/cm3 |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Electrical Resistivity | NA |
Electronegativity | NA |
Titanium Nitride Sputtering Target
Introduction:
Titanium nitride sputtering target is a hard, ceramic material known for its excellent wear resistance, corrosion resistance, and distinctive gold-like appearance. TiN is often deposited as a thin film through physical vapor deposition (PVD) techniques, with sputtering being a common method. Sputtering targets made of TiN are used in various industries due to their ability to enhance surface properties of substrates.
Applications
Tool Coatings: TiN is widely used to coat cutting tools, dies, and molds to increase their hardness and reduce friction, leading to longer tool life and improved machining performance.
Biomedical Devices: TiN coatings can be applied to implants and surgical instruments, improving biocompatibility and reducing wear in biological environments.
Optical Coatings: In optics, TiN is used for thin film coatings that enhance durability and scratch resistance of lenses and other optical components.
Semiconductor Manufacturing: TiN is employed as a barrier layer in microelectronics to prevent diffusion of copper into silicon, thereby improving the performance and reliability of semiconductor devices.
Decorative Coatings: Due to its gold-like appearance, TiN is also used for decorative applications in jewelry, consumer electronics, and automotive parts, providing an aesthetic appeal along with protective properties.
Wear-Resistant Coatings: TiN coatings are applied to various components in automotive and aerospace industries to improve wear resistance and extend the life of parts exposed to harsh conditions.