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Titanium Nitride Sputtering Target

Titanium Nitride Sputtering Target

Titanium Nitride Sputtering Target
Product No NRE-43162
CAS No. 25583-20-4
Formula TiN
Molecular Weight 61.87 g/mol
Purity 99.9%
Density 5.24 g/cm3
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round
Electrical Resistivity NA
Electronegativity NA

Titanium Nitride Sputtering Target

Introduction:

Titanium nitride sputtering target is a hard, ceramic material known for its excellent wear resistance, corrosion resistance, and distinctive gold-like appearance. TiN is often deposited as a thin film through physical vapor deposition (PVD) techniques, with sputtering being a common method. Sputtering targets made of TiN are used in various industries due to their ability to enhance surface properties of substrates.

Applications

Tool Coatings: TiN is widely used to coat cutting tools, dies, and molds to increase their hardness and reduce friction, leading to longer tool life and improved machining performance.

Biomedical Devices: TiN coatings can be applied to implants and surgical instruments, improving biocompatibility and reducing wear in biological environments.

Optical Coatings: In optics, TiN is used for thin film coatings that enhance durability and scratch resistance of lenses and other optical components.

Semiconductor Manufacturing: TiN is employed as a barrier layer in microelectronics to prevent diffusion of copper into silicon, thereby improving the performance and reliability of semiconductor devices.

Decorative Coatings: Due to its gold-like appearance, TiN is also used for decorative applications in jewelry, consumer electronics, and automotive parts, providing an aesthetic appeal along with protective properties.

Wear-Resistant Coatings: TiN coatings are applied to various components in automotive and aerospace industries to improve wear resistance and extend the life of parts exposed to harsh conditions.

 

 

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