Magnesium Aluminate Sputtering Target
Magnesium Aluminate Sputtering Target
Magnesium Aluminate Sputtering Target | |
Product No | NRE-43096 |
CAS No. | 12068-51-8 |
Formula | Al2MgO4 |
Molecular Weight | 142.27 g/mol |
Purity | 99.99% |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Magnesium Aluminate Sputtering Target
Introduction:
Magnesium aluminate Sputtering Target commonly known as spinel, is a ceramic compound that exhibits a combination of desirable properties, including mechanical strength, thermal stability, and electrical insulation. As a sputtering target, magnesium aluminate is utilized for the deposition of high-quality thin films in various advanced applications, particularly in electronics, optics, and materials science.
Applications
Optical Coatings: magnesium aluminate sputtering used in the fabrication of anti-reflective coatings, mirrors, and filters for optical devices, enhancing performance and durability.
Semiconductor Industry: Employed in the deposition of insulating layers in semiconductor devices, contributing to improved performance and reliability.
Protective Coatings: Al2MgO4 can be used to create protective coatings that enhance wear resistance and thermal stability in harsh environments.
Dielectric Materials: Its electrical insulating properties make it suitable for use as a dielectric material in capacitors and other electronic components.
Phosphor Materials: Magnesium aluminate is used in the development of phosphors for displays and lighting applications, improving brightness and efficiency.
Sputtering: Used in physical vapor deposition (PVD) processes to create thin films for electronic devices, optical coatings, and decorative surfaces.
Coatings: Produces coatings with desirable properties such as hardness, corrosion resistance, and thermal stability.