Our Products

Magnesium Aluminate Sputtering Target

Magnesium Aluminate Sputtering Target

Magnesium Aluminate Sputtering Target
Product No NRE-43096
CAS No. 12068-51-8
Formula Al2MgO4
Molecular Weight 142.27 g/mol
Purity 99.99%
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round

 

Magnesium Aluminate Sputtering Target

Introduction:

Magnesium aluminate Sputtering Target commonly known as spinel, is a ceramic compound that exhibits a combination of desirable properties, including mechanical strength, thermal stability, and electrical insulation. As a sputtering target, magnesium aluminate is utilized for the deposition of high-quality thin films in various advanced applications, particularly in electronics, optics, and materials science.

Applications

Optical Coatings: magnesium aluminate sputtering used in the fabrication of anti-reflective coatings, mirrors, and filters for optical devices, enhancing performance and durability.

Semiconductor Industry: Employed in the deposition of insulating layers in semiconductor devices, contributing to improved performance and reliability.

Protective Coatings: Al2MgO4 can be used to create protective coatings that enhance wear resistance and thermal stability in harsh environments.

Dielectric Materials: Its electrical insulating properties make it suitable for use as a dielectric material in capacitors and other electronic components.

Phosphor Materials: Magnesium aluminate is used in the development of phosphors for displays and lighting applications, improving brightness and efficiency.

Sputtering: Used in physical vapor deposition (PVD) processes to create thin films for electronic devices, optical coatings, and decorative surfaces.

Coatings: Produces coatings with desirable properties such as hardness, corrosion resistance, and thermal stability.

 

error: