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Magnesium Nitride Sputtering Target

Magnesium Nitride Sputtering Target

Magnesium Nitride Sputtering Target
Product No NRE-43099
CAS No. 12057-71-5
Formula Mg3N2
Molecular Weight 100.94 g/mol
Purity 99.99%
Thickness 3 mm ± 0.5mm (can be customized)
Diameter 50 mm ± 1mm (can be customized)
Shape Round

Magnesium Nitride Sputtering Target

Introduction

Magnesium nitride (Mg₃N₂) is an inorganic compound that possesses several intriguing properties, including high thermal stability, electrical conductivity, and potential for use in various advanced applications. As a sputtering target, magnesium nitride is utilized for the deposition of thin films in fields such as electronics, materials science, and surface coatings.

Applications of Magnesium Nitride Sputtering Targets

Semiconductor Devices: Mg₃N₂ thin films are utilized in the fabrication of semiconductor components, such as transistors and diodes, contributing to improved performance and efficiency.

Protective Coatings: Due to its hardness and chemical resistance, magnesium nitride is used as a protective coating in various applications, enhancing wear resistance and surface durability.

Optoelectronic Devices: The electrical and optical properties of magnesium nitride make it suitable for applications in LEDs, laser diodes, and other optoelectronic components.

Thermal Management: Magnesium nitride is explored for its potential in thermal management applications, where effective heat dissipation is critical for device performance.

Research and Development: Ongoing research into magnesium nitride focuses on its superconducting properties and potential uses in advanced materials, where sputtering techniques are employed to create innovative films.

 

 

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