Magnesium Nitride Sputtering Target
Magnesium Nitride Sputtering Target
Magnesium Nitride Sputtering Target | |
Product No | NRE-43099 |
CAS No. | 12057-71-5 |
Formula | Mg3N2 |
Molecular Weight | 100.94 g/mol |
Purity | 99.99% |
Thickness | 3 mm ± 0.5mm (can be customized) |
Diameter | 50 mm ± 1mm (can be customized) |
Shape | Round |
Magnesium Nitride Sputtering Target
Introduction
Magnesium nitride (Mg₃N₂) is an inorganic compound that possesses several intriguing properties, including high thermal stability, electrical conductivity, and potential for use in various advanced applications. As a sputtering target, magnesium nitride is utilized for the deposition of thin films in fields such as electronics, materials science, and surface coatings.
Applications of Magnesium Nitride Sputtering Targets
Semiconductor Devices: Mg₃N₂ thin films are utilized in the fabrication of semiconductor components, such as transistors and diodes, contributing to improved performance and efficiency.
Protective Coatings: Due to its hardness and chemical resistance, magnesium nitride is used as a protective coating in various applications, enhancing wear resistance and surface durability.
Optoelectronic Devices: The electrical and optical properties of magnesium nitride make it suitable for applications in LEDs, laser diodes, and other optoelectronic components.
Thermal Management: Magnesium nitride is explored for its potential in thermal management applications, where effective heat dissipation is critical for device performance.
Research and Development: Ongoing research into magnesium nitride focuses on its superconducting properties and potential uses in advanced materials, where sputtering techniques are employed to create innovative films.